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Improved structural ordering in sexithiophene thick films grown on single crystal oxide substrates

机译:改善在单晶氧化物衬底上生长的六噻吩厚膜的结构有序性

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摘要

We report on sexithiophene films, about 150-nm thick, grown by thermal evaporation on single-crystal oxides and, as comparison, on Si/SiO(2). By heating the entire deposition chamber at 100A degrees C we obtain standing-up oriented molecules all over the bulk thickness. Surface morphology shows step-like islands, each step being only one monolayer in height. The constant and uniform warming of the molecules obtained by heating the entire deposition chamber allows a stable diffusion-limited growth process. Therefore, the regular growth kinetics is preserved when increasing the thickness of the film. Electrical measurements on differently structured films evidence the impact of the inter-island separation region size on the main charge-transport parameters.
机译:我们报告了通过热蒸发在单晶氧化物上和作为比较的Si / SiO(2)上生长的约150 nm厚的六噻吩薄膜。通过将整个沉积室加热到100A摄氏度,我们获得了整个堆积厚度上的直立取向分子。表面形态显示出阶梯状的岛,每个阶梯的高度只有一个单层。通过加热整个沉积腔室而获得的分子的恒定而均匀的加热可以实现稳定的扩散受限的生长过程。因此,当增加膜的厚度时,保留了规则的生长动力学。在不同结构的薄膜上的电学测量证明了岛间分离区大小对主要电荷传输参数的影响。

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